5 October 2016 Correction of deflection under mask’s own weight by bending mask technology
Author Affiliations +
It is known that the photomask substrate deflects when the mask is set on the frame and the deflection is an obstacle to light exposure. In this study, we introduce “the bending mask” to cancel out the deflection. The surface of the bending mask has the height distribution in advance to cancel out the deflection, owing to Nikon’s accurate polishing technology and Nikon’s accurate measurement machine.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takashi Yagami, Takashi Yagami, Takashi Kambayashi, Takashi Kambayashi, Minako Azumi, Minako Azumi, "Correction of deflection under mask’s own weight by bending mask technology", Proc. SPIE 9985, Photomask Technology 2016, 99851X (5 October 2016); doi: 10.1117/12.2241153; https://doi.org/10.1117/12.2241153

Back to Top