5 October 2016 Acoustic characterization of two megasonic devices for photomask cleaning
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Wet photomask cleaning relies on megasonic agitation to enhance the process, but there are many challenges to reliably maximize particle removal efficiency (PRE) and minimize damage. With the shift to pellicle-free EUV masks, photomask processes are more vulnerable to contamination, increasing the urgency to improve the cleaning process. This difficulty is largely due to the unavailability of appropriate measurement of the acoustic field. Typically all that is known about the acoustic output is the driving frequency and the electric power delivered to a transducer, both global parameters that tell little about the field distribution over the substrate, the actual amplitude of the sound at the substrate, or the levels of cavitation (stable and transient) present at the substrate.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Claudio Zanelli, Claudio Zanelli, Dushyanth Giridhar, Dushyanth Giridhar, Manish Keswani, Manish Keswani, Nagaya Okada, Nagaya Okada, Jyhwei Hsu, Jyhwei Hsu, Petrie Yam, Petrie Yam, } "Acoustic characterization of two megasonic devices for photomask cleaning", Proc. SPIE 9985, Photomask Technology 2016, 998524 (5 October 2016); doi: 10.1117/12.2243124; https://doi.org/10.1117/12.2243124


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