UV nano imprint lithography (UV-NIL) has high-throughput and cost-effective for complex nano-scale patterns and is
considered as a candidate for next generation lithography tool. In addition, NIL is the unmagnified lithography and
contact transfer technique using template. Therefore, the lithography performance depends greatly on the quality of the
According to ITRS 2013, the minimum half pitch size of Line and Space (LS) pattern will reach 1x nm level within
next five years. On the other hand, in hole pattern, half pith of 2x nm level will be required in five years. Pattern shrink
rate of hole pattern size is slower than LS pattern, but shot counts increase explosively compared to LS pattern due to its
data volume. Therefore, high throughput and high resolution EB lithography process is required.
In previous study, we reported the result of hole patterning on master template which has high resolution resist
material and etching process. This study indicated the potential for fabricating 2xnm hole master template .
After above study, we aim at fabricating the good quality of 2xnm master template which is assured about defect, CD
uniformity(CDU), and Image placement(IP). To product high quality master template, we develop not only high
resolution patterning process but also high accuracy quality assurance technology. We report the development progress
about hole master template production.