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30 May 2022 A method of writing high-intensity holograms over large exposure regions
Andrew N. Sias, Robert R. McLeod, Amy C. Sullivan, Jamie Kowalski
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Proceedings Volume PC12151, Photosensitive Materials and their Applications II; PC1215109 (2022) https://doi.org/10.1117/12.2623943
Event: SPIE Photonics Europe, 2022, Strasbourg, France
Abstract
The transition from exploring holographic photopolymer dynamics to designing a holographic display presents several challenges, including the need to create phase-matched holograms over large areas using high-intensity exposure conditions. High-intensity recording conditions result in low haze and highly diffraction efficient holograms, but such exposures are typically limited to a relatively low writing area. Here we demonstrate a method by which a high-intensity writing beam is rastered across a large region of holographic material in a manner which locks the phase of the hologram grating vector across the entirety of the exposed region.
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Andrew N. Sias, Robert R. McLeod, Amy C. Sullivan, and Jamie Kowalski "A method of writing high-intensity holograms over large exposure regions", Proc. SPIE PC12151, Photosensitive Materials and their Applications II, PC1215109 (30 May 2022); https://doi.org/10.1117/12.2623943
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KEYWORDS
Holograms
Holography
Air contamination
Diffraction
Diffraction gratings
Holographic materials
Optical design
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