High-NA EUVL exposure tool: program progress and mask interaction

Jan van Schoot

doi:10.1117/12.2656140

15 September 2022 High-NA EUVL exposure tool: program progress and mask interaction

Jan van Schoot

Proceedings Volume PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; PC123250A (2022) https://doi.org/10.1117/12.2656140
Event: Photomask Japan 2022, 2022, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 2022.

Conference Presentation

Citation Download Citation

Jan van Schoot "High-NA EUVL exposure tool: program progress and mask interaction", Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250A (15 September 2022); https://doi.org/10.1117/12.2656140

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