Wing tilt in ELO grown GaN

Ronny Kirste; Seiji Mita; Houston Dycus; Jack Almeter; James Tweedie; James Loveless; Pramod Reddy; Ramon Collazo; Zlatko Sitar

doi:10.1117/12.2650564

21 March 2023 Wing tilt in ELO grown GaN

Ronny Kirste, Seiji Mita, Houston Dycus, Jack Almeter, James Tweedie, James Loveless, Pramod Reddy, Ramon Collazo, Zlatko Sitar

Author Affiliations +

Proceedings Volume PC12421, Gallium Nitride Materials and Devices XVIII; (2023) https://doi.org/10.1117/12.2650564
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

Epitaxial lateral overgrowth (ELO) of GaN is a well-established technology to reduce the dislocation density of III-Nitride films grown on sapphire. One of the longstanding problems with ELO has been the so-called wing tilt. This wing tilt is a result of a tilt of the GaN crystal in the regions not grown on the SiO2 opening which results in high dislocation densities in the coalescence region of the film. In this study, we demonstrate that wing tilt in ELO is result of the SiO2 used to pattern GaN templates. We show that wing tilt occurs immediately at the start of the ELO growth process. Furthermore, we show that wing tilt can be avoided completely if an etched template is used in combination with facet controlled epitaxial lateral overgrowth (FACELO). Results are based on homoepitaxial GaN growth in combination with TEM, XRD, and PL studies.

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Citation Download Citation

Ronny Kirste, Seiji Mita, Houston Dycus, Jack Almeter, James Tweedie, James Loveless, Pramod Reddy, Ramon Collazo, and Zlatko Sitar "Wing tilt in ELO grown GaN", Proc. SPIE PC12421, Gallium Nitride Materials and Devices XVIII, (21 March 2023); https://doi.org/10.1117/12.2650564

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