25 years of EUV multilayer optics development at optiX fab and Fraunhofer IOF

Torsten Feigl; Marco Perske; Hagen Pauer; Tobias Fiedler; Philipp Naujok; Klara Stallhofer; Tina Seifert; Annika Schmitt

doi:10.1117/12.2664589

30 April 2023 25 years of EUV multilayer optics development at optiX fab and Fraunhofer IOF

Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Philipp Naujok, Klara Stallhofer, Tina Seifert, Annika Schmitt

Author Affiliations +

Proceedings Volume PC12494, Optical and EUV Nanolithography XXXVI; PC124940A (2023) https://doi.org/10.1117/12.2664589
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

25 years ago, Fraunhofer IOF started the very first project on EUV multilayer development. This paper summarizes highlights of this exciting journey from the first still low reflecting multilayer coating made in 1998 to today’s 15 million € investment in optiX fab’s EUV optics fab.

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Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Philipp Naujok, Klara Stallhofer, Tina Seifert, and Annika Schmitt "25 years of EUV multilayer optics development at optiX fab and Fraunhofer IOF", Proc. SPIE PC12494, Optical and EUV Nanolithography XXXVI, PC124940A (30 April 2023); https://doi.org/10.1117/12.2664589

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