0.33 NA EUV systems for high volume manufacturing

Stuart Young; Pieter Gunter; Emiel Eussen; Christophe Smeets; Roderik van Es

doi:10.1117/12.2692698

22 November 2023 0.33 NA EUV systems for high volume manufacturing

Stuart Young, Pieter Gunter, Emiel Eussen, Christophe Smeets, Roderik van Es

Proceedings Volume PC12750, International Conference on Extreme Ultraviolet Lithography 2023; PC127500N (2023) https://doi.org/10.1117/12.2692698
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

ASML NXE:3400 and NXE:3600D scanners are firmly embedded in High Volume Manufacturing (HVM) of 7 nm to 3 nm logic devices as well as 10 nm class memory devices. In this paper we will share the latest performance of these systems, including excellent overlay, critical dimension (CD) control, stability, reliability, and high productivity. Furthermore, we will describe the latest technology supporting the ASML roadmap for further improving cost of technology via increased productivity and share system qualification and performance data of the next HVM scanner, the NXE:3800E. Lastly the ASML NXE sustainability roadmap showing progress and steps towards a significant reduction in energy consumption per wafer exposure on NXE systems will be presented.

Conference Presentation

Citation Download Citation

Stuart Young, Pieter Gunter, Emiel Eussen, Christophe Smeets, and Roderik van Es "0.33 NA EUV systems for high volume manufacturing", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC127500N (22 November 2023); https://doi.org/10.1117/12.2692698

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