Poster
22 November 2023 Functional surface treatment process and primers for extremely enhancing EUVL performance
Taiki Saijo, Yuki Furukawa, Shuhei Shigaki, Satoshi Takeda, Wataru Shibayama, Makoto Nakajima, Rikimaru Sakamoto, Kodai Kato
Author Affiliations +
Conference Poster
Abstract
In order to achieve good EUVL performance and pattern etch transfer, we propose functional surface treatment process and primers (FSTP). FSTP is almost single molecular type ultra thin primer (~1nm) covalently bonding to bottom HM not to bother etch transfer. Moreover, FSTP has high universality to EUV PR CAR and MOR to achieve high patterning performance. FSTP can improve CD window and sensitivity with controlling surface unit. Therefore FSTP has big advantage in EUVL process and pattern etch transfer for next generation High NA EUV process.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Taiki Saijo, Yuki Furukawa, Shuhei Shigaki, Satoshi Takeda, Wataru Shibayama, Makoto Nakajima, Rikimaru Sakamoto, and Kodai Kato "Functional surface treatment process and primers for extremely enhancing EUVL performance", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC127500T (22 November 2023); https://doi.org/10.1117/12.2687489
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KEYWORDS
Extreme ultraviolet lithography

Etching

Extreme ultraviolet

Chemical vapor deposition

Coating

Lithography

Optical lithography

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