Presentation
13 March 2024 Sputter-deposited aluminium oxide as a waveguide platform for UV photonics
Author Affiliations +
Abstract
To overcome the increased absorption of commercially available waveguide platforms for UV wavelengths, Al2O3 has been suggested due to its low losses below 450 nm. In this work, we demonstrate Al2O3 waveguides fabricated via reactive sputtering, electron beam lithography and dry etching with losses as low as 2.3 dB/cm at 369 nm. A variety of building blocks required for typical photonic devices are realized using the process which shows promise as a waveguide platform for applications that require UV wavelengths.
Conference Presentation
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dawson B. Bonneville, Ward A. P. M. Hendriks, Soheila Mardani, Nadia Chahir, Bjorn Jongebloed, Meindert Dijkstra, and Sonia M. García-Blanco "Sputter-deposited aluminium oxide as a waveguide platform for UV photonics", Proc. SPIE PC12889, Integrated Optics: Devices, Materials, and Technologies XXVIII, PC1288905 (13 March 2024); https://doi.org/10.1117/12.3004840
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KEYWORDS
Ultraviolet radiation

Waveguides

Quantum photonics

Aluminum oxide

Atomic layer deposition

Integrated photonics

Dry etching

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