DUV Mask Writer addressable to 90nm nodes with a sustainability profile

Robert Eklund

doi:10.1117/12.3012449

26 September 2023 DUV Mask Writer addressable to 90nm nodes with a sustainability profile

Robert Eklund

Proceedings Volume PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; PC129150K (2023) https://doi.org/10.1117/12.3012449
Event: Photomask Japan 2023, 2023, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2023.

Conference Presentation

Citation Download Citation

Robert Eklund "DUV Mask Writer addressable to 90nm nodes with a sustainability profile", Proc. SPIE PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC129150K (26 September 2023); https://doi.org/10.1117/12.3012449

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