DSA materials and processes development for ≤ P24 EUV resist L/S pattern rectification

Eungnak Han; Gurpreet Singh; Tayseer Mahdi; Robert Seidel; Sandra Murcia; Lauren Doyle; Nityan Nair; Nafees Kabir; Sean Pursel; David Shykind; Todd Hoppe; Florian Gstrein

doi:10.1117/12.3012612

10 April 2024 DSA materials and processes development for ≤ P24 EUV resist L/S pattern rectification

Eungnak Han, Gurpreet Singh, Tayseer Mahdi, Robert Seidel, Sandra Murcia, Lauren Doyle, Nityan Nair, Nafees Kabir, Sean Pursel, David Shykind, Todd Hoppe, Florian Gstrein

Author Affiliations +

Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560P (2024) https://doi.org/10.1117/12.3012612
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

We present a comprehensive investigation into DSA materials and process development for P24 EUV lithography with the objective of mitigating DSA defects and enhancing the smoothness of DSA-defined patterns. We conduct a comparative assessment of the quality of DSA-rectified patterns between PS-b-PMMA and high Chi BCP. Furthermore, we explore resist planforms other than CAR for creating DSA guiding patterns.

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Eungnak Han, Gurpreet Singh, Tayseer Mahdi, Robert Seidel, Sandra Murcia, Lauren Doyle, Nityan Nair, Nafees Kabir, Sean Pursel, David Shykind, Todd Hoppe, and Florian Gstrein "DSA materials and processes development for ≤ P24 EUV resist L/S pattern rectification", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560P (10 April 2024); https://doi.org/10.1117/12.3012612

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