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Back Matter
Book: Advanced Processes for 193-nm Immersion Lithography
Author(s): Yayi Wei, Robert L. Brainard
Published: 2009
https://doi.org/10.1117/3.820233.bm
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Abstract
This back matter contains the index and author biographies.
PDF download only.
CHAPTER 1
 10 PAGES
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KEYWORDS
Image processing
Photoresist processing
Standards development
Water
Photomasks
Polymers
Double patterning technology
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