Photochemistry and Radiation Chemistry in Lithography

doi:10.1117/3.2642420.ch5

Book: Chemistry and Lithography, Second Edition, Vol. 2: Chemistry in Lithography

Author(s): Uzodinma Okoroanyanwu

Published: 2023

https://doi.org/10.1117/3.2642420.ch5

Author Affiliations +

Abstract

Distinct photochemical reactions and photophysical processes as well as radiochemical reactions and radiochemical processes are involved in the generation of radiation from lithographic exposure sources, and in the interaction of exposure radiation with lithographic optical elements, constituents of the exposure medium, and resist materials. These photochemical and radiochemical reactions and photophysical and radiochemical processes resulting from the interactions between the exposure radiation and radiation-sensitive resists and their constituents underlie the basis of the contrast between the exposed and the unexposed regions of the resist film. We examine some of these reactions and interactions in the succeeding sections.