Chemistry of Photochemical and Radiochemical Imaging Mechanisms of Negative-Tone Resists

doi:10.1117/3.2642420.ch6

Book: Chemistry and Lithography, Second Edition, Vol. 2: Chemistry in Lithography

Author(s): Uzodinma Okoroanyanwu

Published: 2023

https://doi.org/10.1117/3.2642420.ch6

Author Affiliations +

Abstract

Characteristically, negative resists of the modern era (since 1950) have high chemical resistance and good image reproduction qualities. They were widely used in the manufacture of circuit boards and microelectronic devices for these reasons before the advent of positive resists. Because of their high chemical resistance, negative resists are generallymoredifficult to strip and clean than other resists, although there are satisfactory resist strippers, as described in Chapter 2.