Access to eBooks is limited to institutions that have purchased or currently subscribe to the SPIE eBooks program. eBooks are not available via an individual subscription. SPIE books (print and digital) may be purchased individually on SPIE.Org.

Contact your librarian to recommend SPIE eBooks for your organization.
Chapter 4B:
High-Brightness LDP Source for Mask Inspection
A laser-assisted discharge-produced plasma (LDP) source is being developed as an EUV source in mask inspection tool at BLV Licht- und Vakuumtechnik GmbH, Germany in cooperation with Fraunhofer Institute for Laser Technology (ILT), Germany, under the management of Ushio Inc., Japan. This unique system, in which a small laser is used to create the plasma that is then heated by a high-current discharge to obtain the EUV-emitting plasma, is based on the technology developed for the alpha- and beta-level EUV source for EUV lithography scanners. However, the changes made to the system architecture and operational parameters turned this technology into a high-brightness EUV source for mask inspection.
Online access to SPIE eBooks is limited to subscribing institutions.

Back to Top