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Chapter 10:
EUVL System Patterning Performance
Abstract
The great promise of EUVL comes from its tremendous reduction in wavelength, it being a photon-based technology and thus free of chargedparticle limitations, and it being a projection-based demagnifying system, avoiding the problems of 1X and contact masks. The latter two characteristics make it clear that EUVL is simply an extension of conventional optical projection lithography, allowing us to leverage half a century of learning.
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CHAPTER 10
37 PAGES


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