Access to eBooks is limited to institutions that have purchased
or currently subscribe to the SPIE eBooks program. eBooks are not
available via an individual subscription. SPIE books (print and
digital) may be purchased individually on
Contact your librarian to recommend SPIE eBooks for your organization.
The great promise of EUVL comes from its tremendous reduction in wavelength, it being a photon-based technology and thus free of chargedparticle limitations, and it being a projection-based demagnifying system, avoiding the problems of 1X and contact masks. The latter two characteristics make it clear that EUVL is simply an extension of conventional optical projection lithography, allowing us to leverage half a century of learning.
Online access to SPIE eBooks is limited to subscribing institutions.