High-Power EUV Source by Gigaphoton for High-Volume Manufacturing

Mizoguchi, Hakaru, Gigaphoton Inc.; Yamazaki, Taku, Gigaphoton Inc.; Yanagida, Tatsuya, Gigaphoton Inc.; Nowak, Krzysztof M., Gigaphoton Inc.; Saito, Takashi, Yamaguchi Univ.

doi:10.1117/3.2305675.ch3B

Book: EUV Lithography, Second Edition

Editor(s): Vivek Bakshi

Author(s): Hakaru Mizoguchi, Taku Yamazaki, Tatsuya Yanagida, Krzysztof Nowak, Takashi Saito

Published: 2018

https://doi.org/10.1117/3.2305675.ch3B

Author Affiliations +

Abstract

Extreme ultraviolet (EUV) light sources have been developed together with scanning exposure tools. A 10-W EUV light source tool was shipped by ASML as an a-demo tool in 2007 and by Nikon as EUV-1 in 2008. ASML then developed a b-tool: the NXE-3100 at the beginning of 2011 with a 100-W EUV light source. Requirements of the EUV exposure tool are now represented by the g-tool: the NXE3300 [for high-volume manufacturing (HVM)]. Several machines have been already shipped since 2013. The required EUV power is 250 W of clean power [after purifying infrared (IR) and deep-ultraviolet (DUV) spectra] at intermediate focus (IF) for the current generation of EUVL scanners, and this requirement is expected to rise to 500 W for the next generation of EUVL scanners.6 The current demonstrated power level is 250 W. In this chapter, we present the latest results of EUV sources having more than 100-W EUV power, as well as the design of a 250-W EUV source produced by Gigaphoton and the progress in its development for semiconductor HVM.