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Chapter 4B:
High-Brightness LDP Source for Mask Inspection
Editor(s): Vivek Bakshi
Published: 2018
DOI: 10.1117/3.2305675.ch4B
A laser-assisted discharge-produced plasma (LDP) source is being developed as an EUV source in mask inspection tool at BLV Licht- und Vakuumtechnik GmbH, Germany in cooperation with Fraunhofer Institute for Laser Technology (ILT), Germany, under the management of Ushio Inc., Japan. This unique system, in which a small laser is used to create the plasma that is then heated by a high-current discharge to obtain the EUV-emitting plasma, is based on the technology developed for the alpha- and beta-level EUV source for EUV lithography scanners. However, the changes made to the system architecture and operational parameters turned this technology into a high-brightness EUV source for mask inspection.
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