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Optical Systems for EUVL
Book: EUV Lithography, Second Edition
Editor(s): Vivek Bakshi
Author(s): Sascha Migura, Winfried Kaiser, Jens Timo Neumann, Hartmut Enkisch, Dirk Hellweg
Published: 2018
https://doi.org/10.1117/3.2305675.ch5
Author Affiliations +
Abstract
Optical technologies play an enabling role in the continuation of Moore’s law. The smallest achievable structure on a chip is linked to the resolution limit of the optical system used in the lithographic process. The underlying theory of optical imaging was investigated in 1873 by Ernst Abbe.
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CHAPTER 5
 110 PAGES
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Mirrors
Extreme ultraviolet
Photomasks
Extreme ultraviolet lithography
Reflectivity
Coating
Projection systems
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