Chapter 10:
Fundamentals of EUVL Scanners
Editor(s): Vivek Bakshi
Author(s): Ota, Kazuya
Published: 2008
DOI: 10.1117/3.769214.ch10
Abstract
Other than their use of different wavelengths, EUV and DUV scanners are similar instruments. Since there are no substantial transparent materials for EUV light, the illumination and projection optics must be catoptric and the light path must be in a vacuum. Much more effort and a greater cost are needed to switch the wavelength from 193 to 13.5 nm than to switch it from 248 to 193 nm. In a DUV scanner, light with a 193-nm wavelength emitted from an argon-fluorine (ArF) excimer laser is directed to a reticle by illumination optics that consist of many optical elements. Images on a reticle are projected onto a wafer by projection optics of 1∕4 magnification. A reticle and a wafer are each mounted on the scanning stage, and they are run synchronously at a speed that corresponds to the magnification of the projection optics. Fiducial marks on the stages are used for various calibrations. A wafer alignment sensor detects the position of the wafer alignment mark on a wafer. The distance between the wafer surface and the projection optics is measured with a wafer focus sensor.
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CHAPTER 10
21 PAGES


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