EUV Lithography Costs

doi:10.1117/3.2581446.ch9

Book: Extreme Ultraviolet Lithography

Author(s): Harry J. Levinson

Published: 2020

https://doi.org/10.1117/3.2581446.ch9

Abstract

Because the equipment and materials for semiconductor lithography are expensive, the overall cost of lithography has received considerable attention. There are a number of components that contribute to lithography costs, and each of these will be discussed in more detail in this chapter as they pertain to EUV lithography. Because the impact of mask costs is highly dependent on the number of wafers produced per mask, wafer and mask costs are considered separately, although the situation for EUV lithography is somewhat more complex than for optical lithography, at least for situations in which pellicles are not in use.