Issues in Nanolithography for Quantum Effect Device Manufacture

Peckerar, Martin C., U.S. Naval Research Lab.; Perkins, Frank Keith, U.S. Naval Research Lab.; Dobisz, Elizabeth A., Spin Transfer Technologies, Inc.; Glembocki, Orest J., U.S. Naval Research Lab.

doi:10.1117/3.2265070.ch8

Chapter 8:
Issues in Nanolithography for Quantum Effect Device Manufacture

Book: Handbook of Microlithography, Micromachining, and Microfabrication. Volume 1: Microlithography

Editor(s): P. Rai-Choudhury

Author(s): Peckerar, Martin C., U.S. Naval Research Lab.; Perkins, Frank Keith, U.S. Naval Research Lab.; Dobisz, Elizabeth A., Spin Transfer Technologies, Inc.; Glembocki, Orest J., U.S. Naval Research Lab.

Published: 1997
https://doi.org/10.1117/3.2265070.ch8

Abstract

In 1975 Moore published his now famous curve depicting the shrinkage of device critical dimensions over time. A version of this curve is shown as Fig. 8.1. Over the past 20 years, this curve has provided a remarkably good means of projecting future processing requirements. As extrapolation of the curve indicates, in the first decade of the next century, the size of minimum features will be at or less than 100 nm. No matter what the governing principle of device operation is, “quantum effects” (i.e., tunneling and particle-wave interference effects) must be accounted for in predicting device performance.

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CHAPTER 8
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