Access to eBooks is limited to institutions that have purchased or currently subscribe to the SPIE eBooks program. eBooks are not available via an individual subscription. SPIE books (print and digital) may be purchased individually on SPIE.Org.

Contact your librarian to recommend SPIE eBooks for your organization.
Abstract

Objectives

After finishing this chapter, the reader will be able to:

    • list the four components of photoresist
    • describe the difference between positive and negative photoresists
    • describe a photolithography processing sequence
    • list four alignment and exposure systems
    • identify the most commonly used alignment and exposure system in IC production
    • describe the wafer movement in a track-stepper integrated system
    • explain the relationship between resolution and depth of focus with wavelength and numerical aperture
    • list at least three candidates for next-generation lithography.
Online access to SPIE eBooks is limited to subscribing institutions.
CHAPTER 6
58 PAGES


SHARE
Back to Top