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Reviews such as Bunshah  and Pulker  describe numerous methods of laying down films, such as chemical deposition, sputtering and vacuum evaporation. It is certain that chemical vapor deposition and plasma chemical vapor deposition are destined for widespread use in future optical coatings, although their use is in its infancy now. Excluding the coatings on architectural glass, most are presently deposited by vacuum evaporation. It is for this reason that this chapter focuses on this method.
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