PDF ISBN: 9780819481023 | Print ISBN: 9780819453136
DESCRIPTION
Baumeister organizes this book around the key subjects associated with functions of optical thin film performance, and provides a valuable resource in the field of thin film technology. The information is widely backed up with citations to patents and published literature.
The author draws from 25 years of experience teaching classes at the UCLA Extension Program, and at companies worldwide to answer questions, such as: what are the conventions for a given analysis formalism? and, what other design approaches have been tried for this application?
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1.1 Fabrication of multilayer interference devices
1.1.1 How do multilayers function?
1.1.2 Nonoptical attributes of surface coatings
1.2 Nomenclature and general properties
1.2.1 Nomenclature
1.2.2 Reflectance and transmittance
1.2.3 Wavelength and frequency
1.2.4 Angle shift
1.3 Antireflection coatings
1.3.1 Choice of an antireflection coating
1.3.2 Antireflection coatings for the IR
1.3.3 Antireflection coatings for fiber-optic communication devices
1.3.4 Antireflection coatings at nonnormal incidence
1.3.5 Out of bandwidth reflectance
1.3.6 Specification of an antireflection coating
1.3.7 Alternatives to vacuum-deposited antireflection coatings
1.4 Spectral filtering and narrowband rejection
1.4.1 Comparison of interference and absorption filters
1.4.2 Selective absorbers
1.4.3 Reflection filter
1.4.4 Narrowband attenuator
1.5 Filters with broad spectral bandwidth
1.5.1 Introduction
1.5.2 Edge filters
1.5.3 Dichroic coating
1.5.4 Coatings for the IR
1.5.5 Effect of humidity
1.5.6 Specification of an edge filter
1.5.7 Edge filter for color control
1.5.8 Thermal control coatings
1.5.9 Regenerative coatings
1.5.10 Coatings for solar cells
1.5.11 Thermal control for satellites
1.5.12 Short-wave pass — a case study
1.6 Bandpasses
1.6.1 Applications
1.6.2 Single-cavity bandpass filters
1.6.3 Classes of bandpass filters
1.6.4 Attributes of conventional bandpass filters
1.6.5 Blocking of a bandpass
1.6.6 Bandpass in convergent flux
1.6.7 Attributes of a bandpass for wavelength multiplexing or wavelength demultiplexing
1.7 Reflectors — used principally at normal incidence
1.7.1 Introduction
1.7.2 Criteria for the selection of reflectors
1.7.3 Overview of reflectors
1.7.4 Metallic reflectors
1.7.5 Overcoated metals
1.7.6 All-dielectric reflectors
1.7.7 Reflectors containing metal layers
1.7.8 Reflector for an optical waveguide
1.7.9 A checklist for the specification of reflector
1.8 Beamdividers, dichroics and polarizers
1.8.1 Introduction
1.8.2 Beamdividers
1.8.3 Linear polarizers
1.8.4 Dichroic reflectors
1.8.5 Miscellaneous topics
1.8.6 Coatings: costs and specifications
1.9 Miscellaneous topics
1.9.1 Clear aperture, jig marks and bevels
1.9.2 Cementing of coatings
1.9.3 Neutral density
1.9.4 Absorbers — both selective and broadband
1.9.5 Coatings for glass on buildings
1.9.6 Interference photocathode
1.9.7 Electrically conducting coatings
1.9.7 Electrically conducting coatings
1.9.8 Lateral variation of R or T
1.9.9 Unusual coatings and systems
1.9.10 Coatings for fiber optic communication systems
1.10 Appendices
1.10.1 The creation of an environment for an optical coating when the impinging light is noncollimated
1.10.2 Coating designs
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2.1.3 Dispersion of the medium in which the wave propagates
2.2 Reflection and transmission at an interface
2.2.1 Overview and establishment of terminology
2.2.2 Boundary conditions at an interface
2.2.3 Fresnel coefficients at an interface
2.2.4 Radiant reflectance and transmittance
2.2.5 Analogy between admittance and an optical coating
2.2.6 Addition of waves at an interface
2.3 Phase shift upon reflection and node of the standing wave
2.3.1 Definition of phase shift
2.3.2 Standing waves normal to an interface
2.3.3 Lateral standing waves
2.3.4 Differential phase shift and reflectance vs angle of incidence
2.3.5 Constraints on the reflection and transmission coefficients
2.3.6 Conventions relating to the phase shift upon reflection
2.4 Properties of a multilayer
2.4.1 Introduction
2.4.2 Radiant reflectance and transmittance of a single layer
2.4.3 Use of the E+E matrix
2.4.4 Characteristic matrix of a homogeneous layer
2.4.5 Recursion methods of computing the reflectance
2.4.6 Comparison of computational methods
2.5 Design concepts used at nonnormal incidence
2.5.1 Introduction
2.5.2 Optical thickness and effective thickness
2.5.3 Effective index
2.6 Aids to computation
2.6.1 Introduction
2.6.2 Matrix relationships
2.6.3 Special layers
2.6.4 Partitioning of a multilayer
2.6.5 Admittance transformation layers
2.6.6 Optimization
2.6.7 Equivalent layers
2.7 Properties of a stack with equal optical thickness layers
2.7.1 Introduction
2.7.2 Conventions for specifying thicknesses of layers
2.7.3 Admittance of a stack with layers of equal optical thickness
2.7.4 R/T polynomial
2.8 Graphical aids to multilayer design
2.8.1 Introduction
2.8.2 Graphical presentation
2.8.3 Vector addition of amplitudes
2.9 Standing waves, net flux ratio and absorption
2.9.1 Introduction
2.9.2 Net flux ratio — definition and properties
2.9.3 Methods of computing the net flux ratio
2.9.4 Maximum net flux ratio and its attainment
2.9.5 Computation of absorption using net flux ratio
2.9.6 Loss in weakly absorbing layers
2.10 Appendices — Propagation of electromagnetic waves
2.10.1 Assumptions about waves and the medium in which they propagate
2.10.2 Propagation of EM waves in isotropic homogeneous media
2.10.3 Propagation in an inhomogeneous and anisotropic medium
2.11 Appendices
2.11.1 Dispersion of the medium
2.11.2 Equivalent layers in terms of dimensionless parameters
2.11.3 Synthesis of an equivalent layer
2.11.4 Spectral bandwidth of a single-cavity bandpass
2.11.5 Reflection coefficients in terms of sheet resistance
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3.1 Methods of depositing a thin film — a conceptual view
3.1.1 Transport and attachment
3.2 Deposition methods — hardware and procedures
3.2.1 Physical vapor deposition
3.2.2 Chemical processes
3.2.3 Miscellaneous processes
3.3 Overview of physical vapor deposition and film formation
3.3.1 Conditions for thin film deposition
3.3.2 Steps in film formation
3.4 Process parameters influencing optical properties
3.4.1 Method of deposition
3.4.2 Vapor impingement angle
3.4.3 Post deposition environment of a film
3.4.4 Temperature shift of coatings
3.5 Criteria for thin film material selection
3.5.1 Introduction
3.5.2 Producibility
3.5.3 Refractive index, absorption and inhomogeneity
3.5.4 Scatter and other losses
3.5.5 Mechanical stress
3.5.6 Thickness limits
3.5.7 Adhesor layers
3.5.8 Sacrificial layers
3.5.9 Other criteria
3.6 Survey of coating materials
3.6.1 Introduction
3.6.2 Dielectric coating materials
3.6.3 Mixtures — mostly all-dielectric
3.6.4 Absorbing materials
3.6.5 Commonly used coating materials
3.7 (Appendix) List of useful coating materials
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4.1 Antireflection coating design by computer optimization
4.1.1 Can optimization produce an adequate antireflection coating?
4.1.2 Design procedure
4.1.3 Examples
4.1.4 Antireflection coating that functions at nonnormal incidence
4.1.5 Optimization or analytical design — which should be used?
4.2 Design methods and evaluation of antireflection coatings
4.2.1 Design methods
4.2.2 Evaluation of an antireflection coating
4.2.3 Electrical impedance mismatch and optical coating
4.2.4 Symmetry of the reflectance vs wave number curve
4.3 Multiple quarterwave and other narrowband designs
4.3.1 Introduction
4.3.2 Single layers
4.3.3 Multiple layers of quarterwave optical thickness
4.3.4 Two layers of unequal optical thickness
4.4 All-dielectric antireflection coatings deposited upon metallic layers
4.4.1 Introduction
4.4.2 Design procedure
4.4.3 Antireflection coating deposited upon a transition metal
4.4.4 Antireflection coating deposited upon a semitransparent metal
4.5 Coatings with broader spectral bandwidth — maximally flat designs
4.5.1 Introduction
4.5.2 Quasimaximally flat designs
4.6 Coating with zero reflectance at two or more wavelengths
4.6.1 Introduction
4.6.2 Quarter-half coating
4.6.3 Zeroes of reflectance — manifold solutions
4.7 Chebyshev antireflection coatings
4.7.1 Introduction: their attributes
4.7.2 Procedure for design
4.7.3 Comparison with maximally flat antireflection coating
4.8 Step-up and step-down of admittance
4.8.1 Introduction
4.8.2 Quasimaximally flat quarter-half-quarter
4.8.3 Quarter-half-quarter: wavelengths of zero reflectance
4.8.4 Simulation of the bottom layer with two materials
4.8.5 Design with an equivalent center layer
4.9 Miscellaneous topics
4.9.1 Simultaneous reduction of the reflectance in the visible and IR
4.9.2 Simulated graded refractive index using equivalent layers
4.9.3 Realization of coatings
4.9.4 Design using linear programming
4.9.5 Antireflection coatings for nonnormal incidence
4.9.6 Antireflection coatings for multiple substrates
4.9.7 Antireflection coating that matches optical cement to glass
4.10 Appendix: Proofs, derivations and designs
4.10.1 Two-layer unequal thickness
4.10.2 Maximally flat
4.10.3 Simultaneous and manifold solutions
4.10.4 Quarter-half coating
4.10.5 Reflectance zeros of Q Q and Q Q Q coatings
4.10.6 Chebyshev antireflection coatings
4.10.7 Zero reflectance of quarter-half-quarter antireflection coating
4.10.8 Appendix — designs of antireflection coatings
4.10.9 Additional information about antireflection coatings
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5.1.1 Examples — use of vector diagrams to calculate reflectance
5.1.2 Example — output coupler for a carbon dioxide laser
5.1.3 Nonquarterwave coatings
5.1.4 Narrowing of the bandwidth
5.2 Analysis of the basic period
5.2.1 Introduction
5.2.2 Stop band and passband — conceptual
5.2.3 Quantitative definition of the stop band
5.2.4 Spectral width of a stop band
5.2.5 Higher order stop bands
5.2.6 Splitting of the layers in a basic period
5.3 "Single-stack" coatings
5.3.1 Decision rules that produce an optimal quarterwave reflector
5.3.2 Reflectance of a quarterwave stack — derived from admittance
5.3.3 Rejection filters
5.3.4 Blocking filters and reflectors
5.3.5 Suppression of reflection peaks of higher order stop bands
5.3.6 Spectral region of flattened reflectance
5.3.7 Dual-band reflectors
5.3.8 Performance of stacks at nonnormal incidence
5.3.9 Minus filter
5.3.10 Loss and absorption in a quarterwave stack
5.4 Edge filter design
5.4.1 Introduction
5.4.2 Optimization
5.4.3 Equivalent layers in edge filters
5.5 Broadband reflectors and rejection filters
5.5.1 Two-component stacks with overlapping stop bands
5.5.2 Hot mirror without overlapping stop bands
5.5.3 Broadband IR rejection filter
5.5.4 Design techniques
5.6 Phase shift upon reflection
5.6.1 Introduction
5.6.2 Quarterwave stacks and similar periodic media
5.6.3 Broadband reflectors
5.6.4 Phase shift due to thickness changes
5.6.5 Phase shift upon reflection — nonnormal incidence
5.7 Miscellaneous topics
5.7.1 Overcoated metallic reflector
5.7.2 Broadband reflector with relatively low reflectance
5.7.3 IR reflector with visible transmittance
5.7.4 TIR differential phase shift coatings
5.7.5 Protective coatings
5.8 Appendices
5.8.1 Analysis of a periodic structure using matrices
5.8.2 Amplitude reflection coefficient of a periodic structure
5.8.3 Reflectance and phase envelopes
5.8.4 Missing stop bands — solution for the refractive indices
5.8.5 Coating designs
5.8.6 Koppelmann's equation
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6.4.3 Analytical solution for a coating containing two refractive indices
6.4.4 Designs containing three refractive indices
6.5 Nonpolarizing immersed coatings
6.5.1 Introduction
6.5.2 Nonpolarizing — independent of angle
6.5.3 Nonpolarizing at a single angle
6.5.4 Tolerances of the refractive index and layer thickness
6.5.5 Comparison of beamdividers: all-dielectric and containing silver
6.6 Miscellaneous topics
6.6.1 Joining prisms
6.6.2 Linear retarder with 180° differential phase shift upon reflection
6.6.3 References to beamdividers and polarizers in other chapters
6.7 Appendices containing derivations
6.7.1 Condition for the existence of a nonpolarizing angle
6.7.2 Nonpolarizing, nonimmersed system — solution for the indices
6.7.3 Three-component immersed system — solution for the indices
6.7.4 Solution for the reciprocal index squared
6.7.5 Two-component immersed system — solution for the indices
6.8 Appendices containing multilayer designs
6.8.1 Design: polarizer with 52 layers
6.8.2 Design: polarizer with 67 layers
6.8.3 Design: linear polarizer
6.8.4 Design: polarizer with 98 layers
6.8.5 Design: polarizer with 64 layers
6.8.6 Design: 50%-50% beamdivider
6.8.7 Design: 50%-50% beamdivider
6.8.8 Design: all-dielectric beamdivider with minimal polarization splitting
6.8.9 Design: beamdivider with a single silver layer
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7.2.1 Spectral bandwidth control — alteration of the thickness of the spacer
7.2.2 Reflectance of the reflectors
7.2.3 Phase dispersion
7.3 Periodic-structure bandpass design method
7.3.1 Periodic-structure method of bandpass design —overview
7.3.2 Periodic-structure method of bandpass design — procedure
7.4 Filter design using two components
7.4.1 Selection of the periodic structure
7.4.2 Use of a single-section AR
7.4.3 Use of a three-section AR
7.4.4 Comparison of bandpasses
7.4.5 Use of a two-section AR
7.4.6 Phase-dispersion narrowing of the passband
7.4.7 Bandpass with 7% spectral bandwidth
7.5 Periodic structures containing three materials
7.5.1 Design procedure
7.5.2 Design example — 7% spectral bandwidth
7.5.3 Design example — a bandpass with inferior offband rejection
7.5.4 Use of higher order spacers to narrow the spectral bandwidth
7.5.5 Improvement of the average transmittance of the passband
7.5.6 A bandpass viewed as a multiple-cavity filter
7.5.7 "Cavity" — possible meanings of this word
7.5.8 Microwave and periodic-structure design methods — a comparison
7.6 Microwave design method
7.6.1 Attributes of a bandpass
7.6.2 A prototype multiple-cavity filter
7.6.3 Choice of the number of cavities — introduction
7.6.4 Control of the spectral bandwidth of a multiple-cavity bandpass
7.6.5 Design procedure
7.7 Examples of conventional bandpass design
7.7.1 Offband rejection
7.7.2 Two-cavity designs
7.7.3 Discarding of halfwaves
7.7.4 Three-cavity designs
7.7.5 Four-cavity bandpasses
7.7.6 Five-cavity bandpasses — specifications
7.7.7 A six-cavity bandpass — mixed-cavity design
7.7.8 Seven-cavity bandpass — homologous cavity
7.7.9 Bandpasses containing more than seven cavities
7.8 Bandpasses for optical fiber communication
7.8.1 Choice of the number of cavities
7.8.2 Three-cavity bandpass
7.8.3 Four-cavity bandpasses
7.8.4 Design of five-cavity bandpasses
7.8.5 A comparison of the results
7.8.6 Use of a composite spacer layer
7.8.7 Temperature shift of the passband center wavelength
7.9 Additional topics
7.9.1 Phase conjugate bandpass filter
7.9.2 Miscellaneous design methods
7.9,3 Cavity shifting
7.9.4 Effects of absorption upon passband transmittance
7.9.5 Production of a bandpass - effects of layer thickness errors
7.9.6 Performance of a bandpass at nonnormal incidence
7.9.7 Single-cavity bandpass filter used as a linear polarizer
7.9.8 Selection of the number of cavities
7,9.9 Bandwidth and spectral slope of a maximally flat prototype
7.9.10 Design of a bandpass with a large number of cavities
7.9.11 Pulse propagation through a WDM bandpass filter
7.10 Miscellaneous topics and appendices
7.10.1 Design of a prototype bandpass with Cbebyshev transmittance in its passband
7.10.2 Shape factor of a prototype WDM bandpass
7.10.3 Designs of bandpass filters and other coatings
7.10.4 Standing wave ratios of the reflectors of a prototype bandpass with a Chebyshev passband transmittance - the ANSI C source code
7.10.5 Historical notes
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8.1.3 Absorption controlled by the standing wave electric field
8.2 Bandpass filters - general properties
8.2.1 Overview of bandpass filters
8.2.2 Trade-off between maximum transmittance Tm and offband rejection
8.2.3 Simple filters containing one or two metal layers
8.2.4 One-M bandpass filter
8.2,5 Properties of the Two-M bandpass filter
8.3 Design procedures for metal-dielectric bandpass filters
8.3.1 Recommended metals of metal-dielectric bandpass filters
8.3.2 Trade-off between spectral bandwidth and peak transmittance
8.3.3 Overview of multiple-cavity bandpass filter design
8.3.4 Guidelines for the design of multiple-cavity bandpass filter
8.3.5 Bandpass filter design procedures
8.4 Bandpass filter design examples
8.4.1 Introduction
8.4.2 Design procedure — the number of cavities is even
8.4.3 Design procedure — the number of cavities is odd
8.4.4 General discussion
8.4.5 Design of an asymmetrical three-M filter
8.5 Dark mirror absorber
8.5.1 Characterization of the metal
8.5.2 Optimization as a design method
8.5.3 Analytical design procedure
8.6 Reflectors
8.6.1 Reflector with different reflectance from air and substrate sides
8.6.2 Reflection filter
8.7 Beamdivider containing silver
8.8 Neutral density coatings
8.8.1 Effects of inserting the coating into a beam of high irradiance
8.8.2 Precise control of absorbance
8.8.3 Coating with relatively low reflectance
8.8.4 Constant absorbance vs wavelength
8.9 Miscellaneous topics
8.9.1 Amplitude reflection coefficient of an overcoated matching stack
8.9.2 Optical constants of titanium
8.9.3 Historical notes
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9.2.1 Removal of particulates on the substrate by mechanical means
9.2.2 Cleaning of the substrate in liquids
9.2.3 Drying of the substrate
9.2.4 Chemical etching of the substrate surface
9.3 Tooling, initial pumpdown, ion bombardment and heating of substrates
9.3.1 Tooling — introduction
9.3.2 Pumpdown of the vacuum coating tank
9.3.3 Exposure of the substrate to a gas discharge
9.3.4 Heating of the chamber and substrates
9.4 Thin film deposition
9.4.1 Introduction
9.4.2 Thermal evaporation
9.4.3 Electron beam heating of evaporant
9.4.4 Ion beam sputtering as method of depositing coatings
9.4.5 Introduction of gas during the deposition of a coating
9.4.6 Rate control of evaporation sources
9.4.7 Pinholes in coatings
9.4.8 Procedures and hardware for deposition of layers
9.5 Collection of the evaporant upon the substrates
9.5.1 Introduction — fundamental equations
9.5.2 Overview of methods of controlling layer thickness
9.5.3 Molecular intensity distribution
9.5.4 Layer thickness distribution on a flat nonrotating plate
9.5.5 Single rotation of the tooling containing the substrates
9.5.6 Planetary rotation of the piano tooling
9.5.7 The use of masking to achieve thickness uniformity, single rotation
9.5.8 A comparison of single rotation and planetary rotation
9.5.9 Use of masking to produce a nonuniform thickness distribution
9.6 The control of layer thickness during deposition
9.6.1 Non-optical methods
9.6.2 Overview of "optical" monitoring
9.6.3 The hardware of an optical monitor
9.6.4 Indirect monitoring in reflection
9.6.5 Composite direct monitoring
9.6.6 Composite, direct monitoring of a bandpass filter
9.6.7 The optical monitor as a process control instrument
9.7 Mechanical stress in optical coatings
9.7.1 Overview
9.7.2 Measurement of the mechanical stress
9.7.3 Control of the mechanical stress
9.8 Appendices
9.8.1 Planetary motion — equations
9.8.2 Design of an edge filter
9.8.3 Thickness uniformity of a WDM bandpass — introduction
9.8.4 Composite optical monitoring — termination at a maximum or minimum
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10.3 Overall transmittance of an array of coated objects
10.3.1 Introduction
10.3.2 Effects of illumination with non-monochromatic light
10.3.3 Equations for reflectance and transmittance — incoherent illumination
10.3.4 Example of an "element"
10.3.5 Application to the transmittance of a single slab
10.3.6 Examples
10.3.7 Transmittance in convergent flux
10.4 Performance of coatings — their optical characteristics
10.4.1 Introduction
10.4.2 Specular and diffuse measurements
10.4.3 Spectrophotometry — a brief overview
10.4.4 Absorption
10.4.5 Loss
10.4.6 Other optical tests
10.5 Performance of coatings and their non-optical characteristics
10.5.1 Adhesion
10.5.2 Moderate abrasion
10.5.3 Severe abrasion
10.5.4 Humidity
10.5.5 Salt fog
10.5.6 Temperature shock
10.5.7 Specialized tests — fungus and sand erosion
10.5.8 Sequence of the tests
10.6 Phase relations in multilayers
10.6.1 Introduction
10.6.2 Transmissive phase retardance
10.6.3 Reflective phase shift
10.6.4 Constraints upon the phase shifts
10.7 The influence of a coating upon a transmitted or reflected wavefront
10.7.1 Introduction
10.7.2 Transmitted wavefront
10.7.3 Phase of the reflected beam
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