The design of thin-film structures requires an understanding of the fundamental optical properties of reflection, transmission, and absorption in dielectric and metallic materials based on interference. These properties are determined by the complex index of refraction of the materials, and the better the understanding, precision, and accuracy of these measurements the more closely the simulated filter response will match actual device performance. The construction of functional bandpass filters involves translating the design into physical devices with precise transitions between layers at the correct thicknesses in the right order while under vacuum. This requires that the vacuum system, thickness monitoring, deposition control, signal processing, and many other systems be understood and operating correctly to make an optical filter.
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