Optical Lithography Beyond Projection Imaging

doi:10.1117/3.2576902.ch7

Book: Optical and EUV Lithography: A Modeling Perspective

Author(s): Andreas Erdmann

Published: 2021

https://doi.org/10.1117/3.2576902.ch7

Author Affiliations +

Abstract

This chapter provides an overview of diverse alternative optical lithography techniques that do not employ projection imaging of a mask. People with exclusive interest in projection lithography for semiconductor lithography can skip this chapter. For others it provides an overview of alternative optical lithography methods for alternative applications, including a more in-depth discussion of the optical nonlinearities that were already briefly addressed in Section 5.2.