Extreme Ultraviolet Lithography

doi:10.1117/3.2525393.ch12

Book: Principles of Lithography, Fourth Edition

Author(s): Harry J. Levinson

Published: 2019

https://doi.org/10.1117/3.2525393.ch12

Abstract

Since the resolution capability of lithography can be extended by using shortwavelength light, at least in principle, a number of concepts involving light with wavelengths much shorter than 193 nm have been proposed. Considerable effort has been applied to the development of one of these approaches, referred to as extreme ultraviolet (EUV) lithography. In this chapter, the basic concepts underlying EUV technology are discussed.