Access to eBooks is limited to institutions that have purchased or currently subscribe to the SPIE eBooks program. eBooks are not available via an individual subscription. SPIE books (print and digital) may be purchased individually on SPIE.Org.

Contact your librarian to recommend SPIE eBooks for your organization.
Translator Disclaimer
Chapter 12:
Extreme Ultraviolet Lithography
Abstract
Since the resolution capability of lithography can be extended by using shortwavelength light, at least in principle, a number of concepts involving light with wavelengths much shorter than 193 nm have been proposed. Considerable effort has been applied to the development of one of these approaches, referred to as extreme ultraviolet (EUV) lithography. In this chapter, the basic concepts underlying EUV technology are discussed.
Online access to SPIE eBooks is limited to subscribing institutions.
CHAPTER 12
48 PAGES


SHARE
Advertisement
Advertisement
Back to Top