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Abstract
As discussed in Chapter 1, the mask pattern is transferred to the wafer by means of optical projection onto photosensitive materials known as photoresists. These materials clearly play a critical role in lithography. The chemistries of the most common classes of photoresists are outlined in this chapter. However, the emphasis is on operational performance, i.e., the ways in which resists behave, as observable by the practicing lithographer (in contrast to the resist chemist).
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CHAPTER 3
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