Access to eBooks is limited to institutions that have purchased
or currently subscribe to the SPIE eBooks program. eBooks are not
available via an individual subscription. SPIE books (print and
digital) may be purchased individually on
Contact your librarian to recommend SPIE eBooks for your organization.
As discussed in Chapter 1, the mask pattern is transferred to the wafer by means of optical projection onto photosensitive materials known as photoresists. These materials clearly play a critical role in lithography. The chemistries of the most common classes of photoresists are outlined in this chapter. However, the emphasis is on operational performance, i.e., the ways in which resists behave, as observable by the practicing lithographer (in contrast to the resist chemist).
Online access to SPIE eBooks is limited to subscribing institutions.