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Outlook on DNQ/Novolak Systems
Book: Diazonaphthoquinone-based Resists
Author(s): Ralph R. Dammel
Published: 1993
https://doi.org/10.1117/3.2265072.ch7
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Abstract
In section 5.5, we have already touched upon the properties of linearity down to small feature size and high depth-of-focus which are required of a modern photoresist material.
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CHAPTER 7
 27 PAGES
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