Access to eBooks is limited to institutions that have purchased
or currently subscribe to the SPIE eBooks program. eBooks are not
available via an individual subscription. SPIE books (print and
digital) may be purchased individually on
Contact your librarian to recommend SPIE eBooks for your organization.
Chapter 7: Photolithographic Fabrication of Diffractive Optical Elements
The photolithographic processes used for fabrication of diffractive optical elements adapted from the microelectronics industry were broadly described in the previous chapter. These methods are based on the use of photoresist. A more detailed photoresist processing sequence is shown in Fig. 7.1. In this chapter we examine the principles of photolithography and etching and explore their application to the fabrication of diffractive optical elements using binary lithographic masks.
Online access to SPIE eBooks is limited to subscribing institutions.