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Given a circuit pattern to print, how can we determine the optimal lithography approach? If traditional lithography provides sufficient process latitude, there is little reason to use resolution enhancement techniques (RETs). Otherwise we need to pick the appropriate enhancement technique or combination of techniques. An effective procedure for choosing suitable techniques comprises:
1. include applicable approaches based on physical principles,
2. select promising techniques by simulation,
3. determine actual process latitude by experimentation.
This three-step methodology is demonstrated via a 1-Gb dynamic random access memory (DRAM) example.
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