Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects

Philip C. W. Ng; Kuen-Yu Tsai; Yen-Min Lee; Fu-Min Wang; Jia-Han Li; Alek C. Chen

doi:10.1117/1.3576188

1 April 2011 Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects

Philip C. W. Ng, Kuen-Yu Tsai, Yen-Min Lee, Fu-Min Wang, Jia-Han Li, Alek C. Chen

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, Issue 2, 029801 (April 2011). https://doi.org/10.1117/1.3576188

This PDF file contains the errata for “JM3 Vol. 10 Issue 02 Paper 3576188” for JM3 Vol. 10 Issue 02

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Philip C. W. Ng, Kuen-Yu Tsai, Yen-Min Lee, Fu-Min Wang, Jia-Han Li, and Alek C. Chen "Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(2), 029801 (1 April 2011). https://doi.org/10.1117/1.3576188

Published: 1 April 2011

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