Design of high brightness laser-Compton source for extreme ultraviolet and soft x-ray wavelengths

Kazuyuki Sakaue; Akira Endo; Masakazu Washio

doi:10.1117/1.JMM.11.2.021124

3 May 2012 Design of high brightness laser-Compton source for extreme ultraviolet and soft x-ray wavelengths

Kazuyuki Sakaue, Akira Endo, Masakazu Washio

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 2, 021124 (May 2012). https://doi.org/10.1117/1.JMM.11.2.021124

Abstract

Design of a clean, high-brightness light source is presented for extreme ultraviolet/soft x-ray (EUV/SXR) lithography research and mask inspection. Basic characteristics of classical laser-Compton scattering are reviewed, and the laser and electron beam parameters at relatively low energy (EUV to SXR) photon generation are optimized. Recent achievements in each component technology are evaluated on a continuous wave (CW)-operated electron linac and energy recovery linac system, based on superconducting technologies at a 1.3 GHz operation frequency, 10 kW average power, short pulse CO₂ laser, and optical super cavity with a 600- enhancement- factor at 10.6 μm wavelength. Combining both the CW electron beam and short pulse CO₂ laser with super-cavity enhancement, 1 mW/2% ?startb.w.end? flux and 30 kW/mm²/sr/2% ?startb.w.end? brightness laser-Compton source is designed at 6.7-nm wavelength. The technological gap in the present component technologies are discussed, as well as any further required developments.

Citation Download Citation

Kazuyuki Sakaue, Akira Endo, and Masakazu Washio "Design of high brightness laser-Compton source for extreme ultraviolet and soft x-ray wavelengths," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 021124 (3 May 2012). https://doi.org/10.1117/1.JMM.11.2.021124

Published: 3 May 2012

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