Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers

Sasa Bajt; Zu Rong Dai; Erik J. Nelson; Mark A. Wall; Jennifer B. Alameda; Nhan Q. Nguyen; Sherry L. Baker; Jeffrey C. Robinson; John S. Taylor; Andrew L. Aquila; Nora V. Edwards

doi:10.1117/1.2201027

1 April 2006 Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers

Sasa Bajt, Zu Rong Dai, Erik J. Nelson, Mark A. Wall, Jennifer B. Alameda, Nhan Q. Nguyen, Sherry L. Baker, Jeffrey C. Robinson, John S. Taylor, Andrew L. Aquila, Nora V. Edwards

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 5, Issue 2, 023004 (April 2006). https://doi.org/10.1117/1.2201027

Abstract

The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, are investigated to establish their baseline structural, optical, and surface properties in an as-deposited state. The same capping layer structures are then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure is analyzed in detail with transmission electron microscopy (TEM). Compared to other Ru-capping layer preparations studied here, it is the only one that shows grains with preferential orientation. This information is essential to model and optimize the performance of EUVL multilayers.

©(2006) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Sasa Bajt, Zu Rong Dai, Erik J. Nelson, Mark A. Wall, Jennifer B. Alameda, Nhan Q. Nguyen, Sherry L. Baker, Jeffrey C. Robinson, John S. Taylor, Andrew L. Aquila, and Nora V. Edwards "Oxidation resistance and microstructure of ruthenium-capped extreme ultraviolet lithography multilayers," Journal of Micro/Nanolithography, MEMS, and MOEMS 5(2), 023004 (1 April 2006). https://doi.org/10.1117/1.2201027

Published: 1 April 2006

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