Strong broadband optical absorption in silicon nanowire films

Loucas Tsakalakos; Joleyn E. Balch; Jody Fronheiser; Min-Yi Shih; Stephen F. LeBoeuf; Matthew Pietrzykowski; Peter J. Codella; Bas A. Korevaar; Oleg Sulima; James Rand; Anilkumar Davuluru; Umakant D. Rapol

doi:10.1117/1.2768999

1 July 2007 Strong broadband optical absorption in silicon nanowire films

Loucas Tsakalakos, Joleyn E. Balch, Jody Fronheiser, Min-Yi Shih, Stephen F. LeBoeuf, Matthew Pietrzykowski, Peter J. Codella, Bas A. Korevaar, Oleg Sulima, James Rand, Anilkumar Davuluru, Umakant D. Rapol

Author Affiliations +

Journal of Nanophotonics, Vol. 1, Issue 1, 013552 (July 2007). https://doi.org/10.1117/1.2768999

Abstract

The broadband optical absorption properties of silicon nanowire (SiNW) films fabricated on glass substrates by wet etching and chemical vapor deposition (CVD) have been measured and found to be higher than solid thin films of equivalent thickness. The observed behavior is adequately explained by light scattering and light trapping though some of the observed absorption is due to a high density of surface states in the nanowires films, as evidenced by the partial reduction in high residual sub-bandgap absorption after hydrogen passivation. Finite difference time domain simulations show strong resonance within and between the nanowires in a vertically oriented array and describe the experimental absorption data well. These structures may be of interest in optical films and optoelectronic device applications.

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Loucas Tsakalakos, Joleyn E. Balch, Jody Fronheiser, Min-Yi Shih, Stephen F. LeBoeuf, Matthew Pietrzykowski, Peter J. Codella, Bas A. Korevaar, Oleg Sulima, James Rand, Anilkumar Davuluru, and Umakant D. Rapol "Strong broadband optical absorption in silicon nanowire films," Journal of Nanophotonics 1(1), 013552 (1 July 2007). https://doi.org/10.1117/1.2768999

Published: 1 July 2007

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