Oblique lattice systems and its application to design halftone masks

Kanya Ishizaka

doi:10.1117/1.1990109

Abstract

An oblique lattice system (OLS) is defined by two groups of parallel lines in a rectangle, and some properties of the system are mentioned. From the property of OLS that are constrained to rectangle sizes, it is shown that the system provides good mathematical treatments of lattices. Next, a simple algorithm to design integral lattice-based halftone masks by the OLS is introduced. In the algorithm, the "uniform balanced numbering" concept for general halftone masks is decomposed into a simple "local and global numberings" concept for integral lattice-based masks. The OLS is used to realize the local and global numberings concept and to know conditions of halftone masks to design. As a result, we can easily achieve halftone masks based on oblique lattices that realize the required conditions (mask size, resolution, line angle, etc.) and good image quality.

Citation Download Citation

Kanya Ishizaka, "Oblique lattice systems and its application to design halftone masks," Journal of Electronic Imaging 14(3), 033002 (1 July 2005). https://doi.org/10.1117/1.1990109

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $20.00

Non-members: $25.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years