1 July 2005 Oblique lattice systems and its application to design halftone masks
Author Affiliations +
Abstract
An oblique lattice system (OLS) is defined by two groups of parallel lines in a rectangle, and some properties of the system are mentioned. From the property of OLS that are constrained to rectangle sizes, it is shown that the system provides good mathematical treatments of lattices. Next, a simple algorithm to design integral lattice-based halftone masks by the OLS is introduced. In the algorithm, the "uniform balanced numbering" concept for general halftone masks is decomposed into a simple "local and global numberings" concept for integral lattice-based masks. The OLS is used to realize the local and global numberings concept and to know conditions of halftone masks to design. As a result, we can easily achieve halftone masks based on oblique lattices that realize the required conditions (mask size, resolution, line angle, etc.) and good image quality.
© (2005) Society of Photo-Optical Instrumentation Engineers (SPIE)
Kanya Ishizaka, Kanya Ishizaka, } "Oblique lattice systems and its application to design halftone masks," Journal of Electronic Imaging 14(3), 033002 (1 July 2005). https://doi.org/10.1117/1.1990109 . Submission:
JOURNAL ARTICLE
14 PAGES


SHARE
RELATED CONTENT

Show-through watermarking of duplex printed documents
Proceedings of SPIE (June 21 2004)
Improved digital multitoning with overmodulation scheme
Proceedings of SPIE (January 01 1998)
Compressing PC/AT-Based Video Graphics Array (VGA) Images
Proceedings of SPIE (January 29 1990)
Aperiodic microscreen design using DBS and training
Proceedings of SPIE (January 01 1998)
Coding Of Data For Laser Recorders
Proceedings of SPIE (October 25 1983)
Multiresolution binary image embedding
Proceedings of SPIE (June 19 2003)

Back to Top