20 November 2017 Seamless image stitching by homography refinement and structure deformation using optimal seam pair detection
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Abstract
We propose an image stitching method that can remove ghost effects and realign the structure misalignments that occur in common image stitching methods. To reduce the artifacts caused by different parallaxes, an optimal seam pair is selected by comparing the cross correlations from multiple seams detected by variable cost weights. Along the optimal seam pair, a histogram of oriented gradients is calculated, and feature points for matching are detected. The homography is refined using the matching points, and the remaining misalignment is eliminated using the propagation of deformation vectors calculated from matching points. In multiband blending, the overlapping regions are determined from a distance between the matching points to remove overlapping artifacts. The experimental results show that the proposed method more robustly eliminates misalignments and overlapping artifacts than the existing method that uses single seam detection and gradient features.
© 2017 SPIE and IS&T
Daeho Lee, Daeho Lee, Seohyung Lee, Seohyung Lee, } "Seamless image stitching by homography refinement and structure deformation using optimal seam pair detection," Journal of Electronic Imaging 26(6), 063016 (20 November 2017). https://doi.org/10.1117/1.JEI.26.6.063016 . Submission: Received: 5 June 2017; Accepted: 8 November 2017
Received: 5 June 2017; Accepted: 8 November 2017; Published: 20 November 2017
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