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1 January 2011 New approaches of mold fabrication for nanoimprint lithography
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Abstract
We present the new mold fabrications for nanoimprint lithography for the application of ordered array of rod or pore patterning. The concave and convex types of the mold are achieved. For this technology, the master is required preparation before the mold fabrication. The master is utilized by step and repeated to achieve the structures over a large area on the mold. The master, mold, and imprint results demonstrate that the new approaches of mold fabrication could be a feasible scheme with low cost and high throughput.
©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)
Chien-Hung Lin and Rongshun Chen "New approaches of mold fabrication for nanoimprint lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(1), 011506 (1 January 2011). https://doi.org/10.1117/1.3564881
Published: 1 January 2011
JOURNAL ARTICLE
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