Light-shield border impact on the printability of extreme-ultraviolet mask

Takashi Kamo; Kazuo Tawarayama; Yuusuke Tanaka; Yukiyasu Arisawa; Hajime Aoyama; Toshihiko Tanaka; Osamu Suga

doi:10.1117/1.3574117

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1 April 2011 Light-shield border impact on the printability of extreme-ultraviolet mask

Takashi Kamo, Kazuo Tawarayama, Yuusuke Tanaka, Yukiyasu Arisawa, Hajime Aoyama, Toshihiko Tanaka, Osamu Suga

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J. of Micro/Nanolithography, MEMS, and MOEMS, 10(2), 023001 (2011). https://doi.org/10.1117/1.3574117

Abstract

When a thinner absorber mask is applied to extreme ultraviolet (EUV) lithography for chip production, it becomes essential to a introduce light-shield border in order to suppress the leakage of EUV light from the adjacent exposure shots. In this paper, we evaluate the leakage of both EUV and out-of-band from light-shield border and clarify the dependence of lithographic performance on light-shield border structure using a small field exposure tool with/without spectral purify filter (SPF). Then we evaluate the lithographic performance of a thin absorber EUV mask with light-shield border of the etched multilayer type and demonstrate the merit of its structure using a full-field scanner operating under the currently employed condition of EUV source in which SPF is not installed.

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Takashi Kamo, Kazuo Tawarayama, Yuusuke Tanaka, Yukiyasu Arisawa, Hajime Aoyama, Toshihiko Tanaka, and Osamu Suga "Light-shield border impact on the printability of extreme-ultraviolet mask," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(2), 023001 (1 April 2011). https://doi.org/10.1117/1.3574117

Published: 1 April 2011

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