Fabrication of sloped sidewalls by inductively coupled plasma etching for silicon micro-optic structures

Lirong Sun; Andrew M. Sarangan

doi:10.1117/1.3574136

1 April 2011 Fabrication of sloped sidewalls by inductively coupled plasma etching for silicon micro-optic structures

Lirong Sun, Andrew M. Sarangan

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 10, Issue 2, 023006 (April 2011). https://doi.org/10.1117/1.3574136

Abstract

Current work on deep-reactive ion etching has primarily focused on creating vertical sidewalls for microelectromechanical system and electronics applications. For micro-optical and micro-optoelectromechanical system structures control of the sidewall angles other than vertical is as important as the ultimate depth. In this work, we investigate the control of sidewall profiles using an inductively coupled plasma technique. The material systems being investigated on blanket samples are silicon and silicon dioxide with CF₄, CHF₃, and SF₆ chemistries. Micro-optic structures are created by photolithography and CHF₃ gas has been explored to achieve a wide range of etch rates, smooth etch profiles, and sidewall angles. The etch profiles are characterized by scanning electron microscopy.

©(2011) Society of Photo-Optical Instrumentation Engineers (SPIE)

Citation Download Citation

Lirong Sun and Andrew M. Sarangan "Fabrication of sloped sidewalls by inductively coupled plasma etching for silicon micro-optic structures," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(2), 023006 (1 April 2011). https://doi.org/10.1117/1.3574136

Published: 1 April 2011

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