1 April 2011 Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
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This PDF file contains the errata for “JM3 Vol. 10 Issue 02 Paper 3576188” for JM3 Vol. 10 Issue 02
© (2011) Society of Photo-Optical Instrumentation Engineers (SPIE)
Philip C. W. Ng, Philip C. W. Ng, Kuen-Yu Tsai, Kuen-Yu Tsai, Yen-Min Lee, Yen-Min Lee, Fu-Min Wang, Fu-Min Wang, Jia-Han Li, Jia-Han Li, Alek C. Chen, Alek C. Chen, } "Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects," Journal of Micro/Nanolithography, MEMS, and MOEMS 10(2), 029801 (1 April 2011). https://doi.org/10.1117/1.3576188 . Submission:
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