8 March 2012 Traceable calibration of a critical dimension atomic force microscope
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Abstract
The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. One component of this program, and the focus of this paper, is the use of critical dimension atomic force microscopy (CD-AFM). CD-AFM is a commercially available AFM technology that uses flared tips and two-dimensional surface sensing to scan the sidewalls of near-vertical or even reentrant features. Features of this sort are commonly encountered in semiconductor manufacturing and other nanotechnology industries. NIST has experience in the calibration and characterization of CD-AFM instruments and in the development of uncertainty budgets for typical measurements in semiconductor manufacturing metrology. A third generation CD-AFM was recently installed at NIST. The current performance of this instrument for pitch and height measurements generally supports our relative expanded uncertainty (k = 2) goals in the range of 2.0×10−3 and lower. Additionally, a new generation of the NIST single crystal critical dimension reference material (SCCDRM) project is pushing toward feature widths below 10 nm, with the prospect of CD-AFM tip width calibration having expanded uncertainty (k = 2) below 1 nm.
© 2012 Society of Photo-Optical Instrumentation Engineers (SPIE)
Ronald G. Dixson, Ronald G. Dixson, Ndubuisi G. Orji, Ndubuisi G. Orji, Craig McGray, Craig McGray, John E. Bonevich, John E. Bonevich, Jon C. Geist, Jon C. Geist, } "Traceable calibration of a critical dimension atomic force microscope," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(1), 011006 (8 March 2012). https://doi.org/10.1117/1.JMM.11.1.011006 . Submission:
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