Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects

Toshihisa Tomie

doi:10.1117/1.JMM.11.2.021109

21 May 2012 Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects

Toshihisa Tomie

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, Issue 2, 021109 (May 2012). https://doi.org/10.1117/1.JMM.11.2.021109

Abstract

Today intermediate-focus equivalent extreme ultraviolet (EUV) power of several watts is now available, and EUV lithography scanners are being considered as potential scanners for high-volume manufacturing (HVM) tools. However, for high-volume manufacturing with throughput of over 100 wafers per hour, EUV power of 350 W may be required. We review the history of EUV sources for lithography with tin as fuel. We discuss the ideal plasma for tin sources for extreme ultraviolet lithography (EUVL), conditions for a high conversion efficiency of 4% to 5% in 2Πsr, and the existence of a repetition rate limit at around 40 kHz. We review the present status reported by EUV source suppliers and the prospects of tin laser-produced plasma as an EUV source for HVM EUVL.

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Toshihisa Tomie "Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 021109 (21 May 2012). https://doi.org/10.1117/1.JMM.11.2.021109

Published: 21 May 2012

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KEYWORDS

Plasma

Extreme ultraviolet

Tin

Extreme ultraviolet lithography

Xenon

Magnetism

Opacity

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