31 May 2012 Free-standing spectral purity filters for extreme ultraviolet lithography
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Abstract
Free-standing multilayer films consisting of Si, Zr, Mo and silicides of both metals have been fabricated and studied as spectral purity filters (SPF) for extreme ultraviolet (EUV) (13.5 nm) lithography tools. Comparative tests of multilayer SPF structures of various compositions have been performed at high power loads. It was found that a Mo/ZrSi2 structure with MoSi2 capping layers is featured with capability to withstand prolonged heating in vacuum (10−7  mbar) at 900-950°C. A technique of fabrication of large aperture free-standing multilayers was developed, and a pilot sample of the above film structure of 160 mm in diameter, 50 nm thick, with transparency at 13.5 nm above 70% was fabricated as a conceptual prototype of SPFs with large dimensions.
© 2012 Society of Photo-Optical Instrumentation Engineers (SPIE)
Nikolay I. Chkhalo, Mikhail N. Drozdov, Evgeniy B. Kluenkov, Alexsei Ya. Lopatin, Valerii I. Luchin, Nikolay N. Salashchenko, Nikolay N. Tsybin, Leonid A. Sjmaenok, Vadim E. Banine, Andrei M. Yakunin, "Free-standing spectral purity filters for extreme ultraviolet lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 021115 (31 May 2012). https://doi.org/10.1117/1.JMM.11.2.021115 . Submission:
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