3 May 2012 Atomic-hydrogen cleaning of Sn from Mo/Si and DLC/Si extreme ultraviolet multilayer mirrors
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We have investigated the use of atomic-hydrogen-based cleaning to remove Sn contamination from extreme ultraviolet (EUV) multilayer mirrors. Mo and Si surfaces were cleaned at a relatively slow rate due to catalyzed dissociation of tin hydride on these surfaces. Mo/Si mirrors with B4C and Si3N4 cap layers and DLC-terminated DLC/Si mirrors showed complete removal of 10 nm Sn in 20 sec with full restoration of EUV reflectance. In addition, a prolonged cleaning treatment of 300 sec of a DLC/Si mirror resulted in only a minor EUV peak reflection loss of 1.2% absolute and no significant changes in infrared reflectance.
© 2012 Society of Photo-Optical Instrumentation Engineers (SPIE)
Wouter A. Soer, Wouter A. Soer, Maarten M.J.W. van Herpen, Maarten M.J.W. van Herpen, Martin J. Jak, Martin J. Jak, Peter Gawlitza, Peter Gawlitza, Stefan Braun, Stefan Braun, Nikolay N. Salashchenko, Nikolay N. Salashchenko, Vadim Y. Banine, Vadim Y. Banine, } "Atomic-hydrogen cleaning of Sn from Mo/Si and DLC/Si extreme ultraviolet multilayer mirrors," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(2), 021118 (3 May 2012). https://doi.org/10.1117/1.JMM.11.2.021118 . Submission:


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